文摘
The EIS is a useful tool to characterize corrosion behavior of stainless steel, especially when it comes to the properties of the passive film. A specific electrical equivalent circuit was therefore developed to investigate the diffusion/migration of vacancies occurring within this oxide as described in the point defect model. This circuit was used at 20 ¡ãC, 60 ¡ãC and 80 ¡ãC. The vacancy diffusion coefficient calculated was found to be close to 10<sup>? 14sup> cm<sup>2sup> s<sup>? 1sup>.