An XPS study of pulsed plasma polymerised allyl alcohol film growth on polyurethane

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• 作者：Lucy Watkins ; Alexander Bismarck ; Adam F. Lee ; Darren Wilson and Karen Wilson
• 刊名：Applied Surface Science
• 出版年：2006
• 出版时间：30 September 2006
• 年：2006
• 卷：252
• 期：23
• 页码：8203-8211
• 全文大小：601 K

文摘

The growth of highly functionalised poly allyl alcohol films by pulsed plasma polymerisation of CH₂CHCH₂OH on biomedical grade polyurethane has been followed by X-ray photoelectron spectroscopy (XPS) and contact angle measurements. Film thickness is observed to increase approximately linearly with plasma modification time, suggesting a layer-by-layer growth mode of poly allyl alcohol. Water contact angle measurements reveal the change in the surface free energy of wetting decreases linearly with plasma modification up to the monolayer point after which a constant limiting value of −24 mJ m⁻² was attained. Films prepared at 20 W plasma power with a duty cycle of 10 μs:500 μs exhibit a high degree of hydroxyl (OH) retention with minimal fragmentation of the monomer observed. Increasing the plasma power up to 125 W is found to improve OH retention at the expense of ether formation generating films close to the monomer stoichiometry. Duty cycle plays an important role in controlling both film composition and thickness, with longer off times increasing OH retention, while longer on times enhance allyl alcohol film growth.