Formation of SixNy(H) and C:N:H layers by Plasma-Assisted Chemical Vapor Deposition method
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- 作者：Stanisława Jonasa ; Marta Januśa ; Janusz Jaglarzb ; Karol Kyzioła ; kyziol@agh.edu.pl" class="auth_mail" title="E-mail the corresponding author
- 关键词：PA CVD method ; SixNy(H) layer ; C ; N ; H layer ; Growth rate ; Active centers ; Optical properties
- 刊名：Thin Solid Films
- 出版年：2016
- 出版时间：1 February 2016
- 年：2016
- 卷：600
- 期：Complete
- 页码：162-168
- 全文大小：1045 K
文摘
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SixNy(H) and C:N:H layers were grown on Si (001) substrate using RF CVD technique.
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Various times of deposition affect the different optical parameters.
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The microstructure of layers was changed by various time of deposition.
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The stepwise growth rate character of SixNy(H) and C:N:H layers was observed.