Effect of self-bias on the elemental composition and neutron absorption of boron carbide films deposited by RF plasma enhanced CVD
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文摘

Boron carbide films were deposited by RF PECVD, varying substrate RF self-bias.

B/C ratio increased with decreasing RF self-bias leading to boron rich BxC films.

Total macroscopic cross section for neutrons Σt is found to increase with self-bias.

Higher bias caused rise in oxygen impurity in films and decrease in film stability.

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