Nanostructures of mixed-phase boron nitride via biased microwave plasma-assisted CVD

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• 作者：Po-Chih Huang ; Ming-Show Wong
• 关键词：Boron nitride ; Nanostructures ; Chemical vapor deposition ; Plasma etching
• 刊名：Vacuum
• 出版年：2014
• 出版时间：February, 2014
• 年：2014
• 卷：100
• 期：Complete
• 页码：66-70
• 全文大小：1874 K

文摘

Boron nitride films and nanostructures are deposited by the reaction of B₂H₆ and NH₃ in H₂ via biased microwave plasma-assisted chemical vapor deposition. One-dimensional boron nitride nanostructures (BNNSs) are observed on the BN layers by the processing of diamond/BN multilayer under ion-bombardment and plasma etching. At a substrate bias of??100?V, the morphologies of the BNNSs evolve from dense film to nanocorns to nanotips, when the number of the diamond/BN bi-layer increases. Various phases of boron nitride including amorphous-BN, hexagonal h-BN, turbostratic t-BN, rhombohedral r-BN, explosion E-BN, wurtzitic w-BN and cubic c-BN are detected in the BNNSs. The BN nanotips observed are considered to result from the tip structure growth from the combined effects of ion bombardment and plasma etching.