Thermodynamic analysis on deposition of SiBCN ceramic by low pressure chemical vapor deposition/infiltration from SiCH3Cl3BCl3NH3H2Ar system
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文摘
In order to guide the kinetic deposition experiments of siliconboron carbonitride ceramics (Sisingle bondBsingle bondCsingle bondN) from SiCl3CH3single bondNH3single bondBCl3single bondH2single bondAr system, the thermodynamic calculation was undertaken using Factsage software. Predominant condensed phases at equilibrium were SiC, Si3N4, BN, B4C and C. The area of phase regions was affected by deposition parameters, such as temperature, total pressure, dilute H2 ratio, nCH3SiCl3/(nNH3 + nBCl3) and nNH3/(nNH3 + nBCl3). The results showed that Sisingle bondBsingle bondCsingle bondN ceramics with desired phases, such as C + SiC + BN, could be obtained via this system by controlling above parameters theoretically. Kinetic verification at 900 °C demonstrated that Sisingle bondBsingle bondCsingle bondN ceramic could be obtained by low pressure chemical vapor deposition/infiltration from this system. The deposition was amorphous from XRD spectra and mainly constituted by Csingle bondC, Sisingle bondN and Sisingle bondC bonds from XPS analysis, which was in agreement with the results of thermodynamic calculation in general.

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