Interference lithography is reviewed as a technology for the origination of fine-tailored two and three dimensional photonic structures on large areas. With the interference pattern of two or more coherent waves, a wide variety of structures can be generated on areas of up to 1.2 x 1.2 m2. In combination with subsequent microreplication steps, the industrially feasible production of elaborate structures is possible.
After the review of the basic technology, three novel application examples are presented: (1) honeycomb structures for the front side texturization via nanoimprint lithography, (2) diffractive back side gratings for absorption enhancement in the spectral region near the band gap of silicon, and (3) three dimensional photonic crystals as elements for visionary solar cell concepts including advanced light trapping schemes and luminescent processes.