Photon Management Structures Originated by Interference Lithography

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• 作者：Benedikt Blä ; si ; ^a ; ^{Benedikt.blaesi@ise.fraunhofer.de"" rel=""nofollow} ; Hubert Hauser^a ; Oliver Hö ; hn^a ; Volker Kü ; bler^a ; Marius Peters^a ; Andreas J. Wolf^a
• 关键词：photon management ; light trapping ; interference lithography ; microstructures ; nanostructures
• 刊名：Energy Procedia
• 出版年：2011
• 出版时间：2011
• 年：2011
• 卷：8
• 期：Complete
• 页码：712-718
• 全文大小：1984 K

文摘

Since micro- and nanostructures for photon management are of increasing importance in novel high efficiency solar cell concepts, structuring techniques with up-scaling potential play a key role for the realization of these concepts.

Interference lithography is reviewed as a technology for the origination of fine-tailored two and three dimensional photonic structures on large areas. With the interference pattern of two or more coherent waves, a wide variety of structures can be generated on areas of up to 1.2 x 1.2 m². In combination with subsequent microreplication steps, the industrially feasible production of elaborate structures is possible.

After the review of the basic technology, three novel application examples are presented: (1) honeycomb structures for the front side texturization via nanoimprint lithography, (2) diffractive back side gratings for absorption enhancement in the spectral region near the band gap of silicon, and (3) three dimensional photonic crystals as elements for visionary solar cell concepts including advanced light trapping schemes and luminescent processes.