Th
e carbon-doping b
ehaviors of carbon t
etrabromid
e (CBr
4) in Al
xGa
1−xAs mat
erial syst
em ar
e studi
ed by low-pr
essur
e m
etal-organic ch
emical vapor d
eposition (LP-MOCVD). Doping l
ev
el d
ep
end
enc
e on growth t
emp
eratur
e, and V/III ratio is
establish
ed. C-dop
ed InGaAs/AlGaAs/GaAs s
eparat
e confin
em
ent las
er structur
e (
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ent
er bord
er=0 SRC=/imag
es/glyphs/BQ1.GIF>940nm) ar
e grown and d
emonstrat
ed high quality with low-thr
eshold curr
ent d
ensity. High-p
erformanc
e monolithic las
er diod
e arrays ar
e fabricat
ed. A high slop
e effici
ency of 1.17W/A and pow
er
effici
ency of 62 % ar
e achi
ev
ed, which is much b
ett
er than th
e p
erformanc
e of Zn-dop
ed structur
e of th
e sam
e d
esign. Th
er
efor
e, carbon doping is d
emonstrat
ed to hav
e uniqu
e advantag
es ov
er Zn-doping for high-pow
er s
emiconductor las
er applications.