Bone growth around silicon nitride implants—An evaluation by scanning electron microscopy

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• 作者：C.C. Guedes e Silva ; B. Kö ; nig Jr. ; M.J. Carbonari ; M. Yoshimoto ; S. Allegrini Jr. ; J.C. Bressiani
• 关键词：Silicon nitride ; Biomaterial ; Bone ; Scanning electron microscopy
• 刊名：Materials Characterization
• 出版年：2008
• 出版时间：September 2008
• 年：2008
• 卷：59
• 期：9
• 页码：1339-1341
• 全文大小：524 K

文摘

Silicon nitride has demonstrated to be a potential candidate for clinical applications because it is a non-cytotoxic material and has satisfactory fracture toughness, high wear resistance and low friction coefficient. In this paper, samples of silicon nitride, which were kept into rabbits' tibias for 8 weeks, and the adjacent bone tissue were analysed by scanning electron microscopy in order to verify the bone growth around the implants and the interaction between the implant and the bone. Bone growth occurred mainly in the cortical areas, although it has been observed that the newly bone tends to grow toward the marrow cavity. Differences were observed between the implants installed into distal and proximal regions. In the first region, where the distance between the implant and the cortical bone is greater than in the proximal region, the osteoconduction process was evidenced by the presence of a bridge bone formation toward the implant surface. The results showed that silicon nitride can be used as biomaterial since the newly bone grew around the implants.