Heart regeneration: what cells to use and how?
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- 作者：Dimitris Tousoulis ; Alex ; ros Briasoulis ; Charalambos Antoniades ; Elli Stefanadi ; Christodoulos Stefanadis
- 关键词：ZnO ; MOCVD ; Micro-hillock ; Low temperature
- 刊名：Current Opinion in Pharmacology
- 出版年：2008
- 出版时间：April 2008
- 年：2008
- 卷：8
- 期：2
- 页码：211-218
- 全文大小：266 K
文摘
ZnO thin films were grown at a reduced growth temperature on a Si substrate by low-pressure metalorganic chemical vapor deposition. The effects of the reactor pressures and the formation of micro-hillocks on the characteristics of the film were investigated. The ZnO films grown at 210 °C showed mass-transport limited growth behavior and a faceted surface morphology. It was found that the effect of the micro-hillocks on the structural, optical, and electrical properties can be ignored. While the sample grown at 10 Torr showed transparent conductive oxide properties, the sample grown at 3 Torr showed suitable characteristics for use as an ultraviolet emitter.