Reprint of “The effect of Ar plasma etching time on the microstructure, optical and photoelectric properties of CdZnTe films”
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- 作者：Yuelu Zhang ; Jian Huang ; jianhuang@shu.edu.cn" class="auth_mail" title="E-mail the corresponding author ; Jijun Zhang ; Qun Mou ; Yue Shen ; Linjun Wang ; ljwang@shu.edu.cn" class="auth_mail" title="E-mail the corresponding author
- 关键词：CdZnTe film ; Plasma etching ; Surface treatment ; Close-spaced sublimation
- 刊名：Surface and Coatings Technology
- 出版年：2016
- 出版时间：15 December 2016
- 年：2016
- 卷：307
- 期：part_PB
- 页码：1158-1161
- 全文大小：741 K
文摘
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CdZnTe films were treated by Ar plasma etching process with various etching time.
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The structure and surface roughness of the film was closely related to etching time.
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The CdZnTe film with 5 min plasma etching showed lower dark-current.
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CdZnTe films with 5 min plasma etching showed better photo-response to UV light.