Wet-chemical etching of SrMoO3 thin films
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- 作者：Arzhang Mania ; Mohammad Nikfalazarb ; Falk Muencha ; Aldin Radetinaca ; Yuliang Zhengb ; Alex Wiensb ; Sergiy Melnykb ; Holger Mauneb ; Lambert Alffa ; Rolf Jakobyb ; Philipp Komissinskiya ; komissinskiy@oxide.tu-darmstadt.de" class="auth_mail" title="E-mail the corresponding author
- 关键词：SrMoO3 ; Molybdate ; Thin films ; Wet chemical etching ; Electronic materials
- 刊名：Materials Letters
- 出版年：2016
- 出版时间：1 December 2016
- 年：2016
- 卷：184
- 期：Complete
- 页码：173-176
- 全文大小：783 K
文摘
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A method of wet chemical etching of SrMoO3 using alkaline solutions was developed.
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Alkaline etchants were selected based on the chemistry of Sr and Mo oxides.
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SrMoO3 etching rate can be tuned by adjusting the amount of the oxidizing additives.
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The method is compatible with standard photolithographic thin-film processing.