Development of a chemically assisted micro-beam etching system for three-dimensional microanalysis

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• 作者：Tanaka ; Y. ; Karashima ; M. ; Takanashi ; K. ; Sakamoto ; T. ; Owari ; M. ; Nihei ; Y.
• 关键词：SIMS ; CAIBE ; ESD ; Shave-off ; 3D microanalysis ; Reactive gas
• 刊名：Applied Surface Science
• 出版年：2003
• 出版时间：January 15, 2003
• 年：2003
• 卷：203-204
• 期：Complete
• 页码：205-208
• 全文大小：138 K

文摘

A chemically assisted micro-beam etching system for 3D microanalysis was designed. Using chemically assisted ion beam etching (CAIBE) method with FIB shave-off scanning, about several hundred micrometers clean cross-section will be acquired in a few hours. We use focused ion beam (FIB) and electron beam (EB) as micro-beams, halogen or halide mainly as reactive gases. The apparatus was manufactured based on this concept. We found that the FIB, Q-MS and SED worked as expected. The instrumentation has been completed.