Degradation of ofloxacin using UV/H2O2 process in a large photoreactor
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- 作者：Chia-Chang Lin ; higee@mail.cgu.edu.tw" class="auth_mail" title="E-mail the corresponding author ; Hsin-Yi Lin ; Ling-Jung Hsu
- 关键词：Degradation ; Antibiotic ; Ofloxacin ; UV ; H2O2
- 刊名：Separation and Purification Technology
- 出版年：2016
- 出版时间：10 August 2016
- 年：2016
- 卷：168
- 期：Complete
- 页码：57-61
- 全文大小：494 K
文摘
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An effective degradation of ofloxacin using UV/H2O2 process was achieved.
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Ofloxacin was 89% mineralized after 180 min.
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This study provides a novel treatment of wastewater contaminated with ofloxacin.