Manufacturing of XEUV mirrors with a sub-nanometer surface shape accuracy

详细信息    查看全文

• 作者：N.I. Chkhalo ; E.B. Kluenkov ; A.E. Pestov ; V.N. Polkovnikov ; D.G. Raskin ; N.N. Salashchenko ; L.A. Suslov ; M.N. Toropov
• 关键词：Ion etching ; EUV lithography ; Multilayer mirrors ; Roughness
• 刊名：Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
• 出版年：2009
• 出版时间：11 May 2009
• 年：2009
• 卷：603
• 期：1-2
• 页码：62-65
• 全文大小：241 K

文摘

In this paper, first results of finishing EUV mirror substrate surface shape to given parameters using correction methods such as vacuum thin films deposition and local ion-beam etching through the mask are presented. For spherical mirror substrate with radius of curvature R=260 mm and a diameter of 130 mm, obtained values of PV=4.7 nm and RMS=0.6 nm.