In situ infrared measurements during hot filament CVD of diamond in a rotating substrate reactor
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- 作者：Morrison Jr ; Philip W. ; Taweechokesupsin ; Oranut ; Kovach ; Christopher S. ; Roozbehani ; Behrooz ; et. al.
- 关键词：In situ infrared measurements ; Rotating substrate ; High pressure diamond CVD ; Hot filament CVD
- 刊名：Diamond and Related Materials
- 出版年：1996
- 出版时间：April, 1996
- 年：1996
- 卷：5
- 期：3-5
- 页码：242-246
- 全文大小：499 K
文摘
We describe the application of Fourier transform infrared (FTIR) techniques for in situ measurements of the gas phase composition and temperature during the growth of diamond films. The reactor consists of two hot filaments suspended above a rotating substrate; the reactor vessel is a short quartz tube with a small volume to minimize the residence time. The axisymmetric shape of the tube also simplifies the gas flow fields and numerical modeling of the reactor. To understand the effect of pressure on the quality and growth rate, we have performed a series of in situ FTIR measurements directly through the quartz tube at various positions in the reactor. Transmission measurements yield an apparent fractional conversion of CH4 as a function of position and pressure. Simultaneous emission measurements yield values of the average temperature of the gas and the quartz wall temperature. These results are compared with a numerical model of the fluid flow.