Degradation and modification of stainless-steel surface using Cl₂/Ar inductively coupled plasma

详细信息    查看全文

• 作者：Hanbyeol Jang^a ; Alexander Efremov^b ; Sun Jin Yun^c ; Geun Young Yeom^d ; Kyoung Bo Kim^e ; Kwang-Ho Kwon^a ; ^{kwonkh@korea.ac.kr}
• 关键词：Stainless-steel ; Cl2/Ar plasma ; Etching ; Modification ; Roughness ; Free surface energy
• 刊名：Applied Surface Science
• 出版年：2013
• 出版时间：15 August, 2013
• 年：2013
• 卷：279
• 期：Complete
• 页码：41-45
• 全文大小：794 K

文摘

The investigations of stainless steel (SS) etching behavior in the Cl₂/Ar inductively coupled plasma as well as the etched surface characteristics were carried out. It was found that an increase in Ar fraction in the Cl₂/Ar plasma from 0 to 100 % at fixed gas pressure, input power and bias power results in decreasing both etching (degradation) rate of the SS surface (41.3-1.5 nm/min) and mean SS surface roughness (84-20 nm). Plasma diagnostics by Langmuir probes and 0-dimensional plasma modeling provided the data on plasma parameters, steady-state densities and fluxes of active species on the etched surface. It was shown that the maximum changes in mean roughness as well as in both polar and dispersive components of free surface energy correspond to a maximum value of Cl atom flux/ion flux ratio. Also, the linear correlation between free surface energy and mean roughness was obtained.