Photoelectric and passivation properties of atomic layer deposited gradient AZO thin film

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• 作者：Bin Zhao^a ; ^b ; ^{18841620714@163.com} ; Li-dan Tang^a ; Bing Wang^a ; Yi Jia^b ; Jia-heng Feng^b
• 关键词：Gradient AZO thin films ; Al concentration ; Resistivity ; Transmittance ; Passivation
• 刊名：Superlattices and Microstructures
• 出版年：2017
• 出版时间：February 2017
• 年：2017
• 卷：102
• 期：Complete
• 页码：314-322
• 全文大小：1268 K
• 卷排序：102

文摘

Al concentration gradient of AZO thin films were deposited by atomic layer deposition (ALD). Gradient AZO thin films have been proved to have the excellent performance of photoelectric and passivation synchronously. Gradient AZO thin films have great prospects as surface passivation layer for silicon solar cell.