Hydrogenated Mg and Ga co-doped ZnO (HMGZO) films were deposited by magnetron sputtering.
Electrical properties of ZnO films were improved with H2 introduction.
Optical band gap of HMGZO films varied from 3.43 eV to 3.66 eV.
Electron mobility of HMGZO films was enhanced after vacuum annealing.
Single junction a-Si:H solar cell on HMGZO layer with an efficiency of 8.2% was obtained.