Comparison in formation, optical properties and applicability of DC magnetron and RF sputtered aluminum oxide films
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- 作者：M. Seré ; nyia ; serenyi@mfa.kfki.hu" class="auth_mail" title="E-mail the corresponding author ; T. Lohnera ; G. Sá ; frá ; na ; J. Szí ; vó ; sa ; b
- 关键词：Aluminum oxide ; Cathode sputtering ; Optical waveguide
- 刊名：Vacuum
- 出版年：2016
- 出版时间：June 2016
- 年：2016
- 卷：128
- 期：Complete
- 页码：213-218
- 全文大小：1239 K
文摘
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Wafer of ceramic served as target for the RF sputtering process of alumina layer.
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The amorphous layers practically have no absorption in the range of 350–600 nm.
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The role of the excess oxygen for the optical absorption of the RF sputtered amorphous alumina.