Optical and dielectric studies on radio frequency sputtered Gd2O3 doped K0.5Na0.5NbO3 thin films for nonlinear photonic and microwave tunable device applications
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Phase pure Gd2O3 doped KNN thin films deposited using RF magnetron sputtering.

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Dispersion in the refractive index of the films was analyzed using single-oscillator model.

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Nonlinear optical response of the films are measured by modified Zscan method.

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Large third order optical nonlinearity is obtained for pure O2 plasma film.

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Microwave dielectric properties of the films are measured using SPDR technique.

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