Texturing of monocrystalline silicon wafers by HF-HCl-H2O2 mixtures: Generation of random inverted pyramids and simulation of light trapping in PERC solar cells
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- 作者：André ; Stapfa ; Florian Honeitb ; Christoph Gondeka ; Edwin Krokea ; Edwin.Kroke@chemie.tu-freiberg.de" class="auth_mail" title="E-mail the corresponding author
- 关键词：Silicon ; Texturization ; Etching ; Anisotropy ; Modeling
- 刊名：Solar Energy Materials and Solar Cells
- 出版年：2017
- 出版时间：January 2017
- 年：2017
- 卷：159
- 期：Complete
- 页码：112-120
- 全文大小：3005 K
文摘
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Anisotropic etching and formation of pyramidal textures by ACIDIC etching mixtures.
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Unusual formation of random inverted pyramids by stirring of the etching mixture.
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High etch rates up to 13.3 nm s−1 at 20 °C (comparable to KOH-IPA at 75 °C).
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Lower reflectivities than KOH-IPA treated wafers at relevant etch depths.
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Better performance is shown by simulations of PERC solar cells.
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Potential for less cleaning efforts due to the high solubility of metals in HCl.