Rf-sputtering deposition of nano-crystalline zirconia thin films with high transparency
详细信息    查看全文
文摘
Zirconia thin film was deposited on a microscope slide substrate by rf-sputtering. The surface morphology and elemental composition of the film were characterized by SEM and EDX. SEM images showed that the surface morphology of the film consists of spherical-like grains, grain agglomerates and micro voids. EDX experiments showed that the film is composed of 32.82 at % Zr and 67.18 at % O. The microstructure of the film was also investigated by TEM. It was found that the film has poly crystalline grains with nano-sized and different orientations. A study of lattice image for the film was done by HRTEM. The dhkl values were evaluated. Defects and lattice distortions were seen. The optical properties of the film showed that its average optical transmittance in the visible region is high (¡«84 % ) and the values of Eg and Eu are ¡«4.05 eV and ¡«0.446 eV, respectively.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700