Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures

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• 作者：Ghada H. Dushaq ; ^{gdushaq@masdar.ac.ae} ; Mahmoud S. Rasras ; Ammar M. Nayfeh
• 关键词：A. Nanostructures ; A. Thin films ; B. Plasma deposition ; B. Microstructure ; C. Electrochemical measurements ; C. Electron microscopy ; D. Electrical properties ; D. Electrochemical properties ; D. Surface properties ; D. Dielectrics
• 刊名：Materials Research Bulletin
• 出版年：2017
• 出版时间：February 2017
• 年：2017
• 卷：86
• 期：Complete
• 页码：302-307
• 全文大小：1910 K
• 卷排序：86

文摘

Electrophoretic method (EPD) is used to deposit gold nano-particles (GNPs) on oxides matrix. MOS structures with embedded gold nano particles on a top of oxides are fabricated. The capacitive-voltage measurements demonstrate different threshold voltage shifts for different dipping times. The deposition rate decreases for a fixed applied field due to the shielding effect.