Optimisation of anatase TiO2 thin film growth on LaAlO3(0 0 1) using pulsed laser deposition
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- 作者：K. Krupskia ; k.j.krupski@warwick.ac.uk" class="auth_mail" title="E-mail the corresponding author ; k.j.krupski@gmail.com" class="auth_mail" title="E-mail the corresponding author ; A.M. Sancheza ; A. Krupskia ; b ; C.F. McConvillea
- 关键词：Anatase ; Titanium dioxide ; Lanthanum aluminate ; Pulsed laser deposition (PLD) ; Reflection high-energy electron diffraction (RHEED) ; Low-energy electron diffraction (LEED) ; X-ray diffraction (XRD) ; Atomic force microscopy (AFM) ; Scanning tunneling microscopy (STM) ; Scanning transmission electron microscopy (STEM) ; Growth ; Thin film growth
- 刊名：Applied Surface Science
- 出版年：2016
- 出版时间：1 December 2016
- 年：2016
- 卷：388
- 期：part_PB
- 页码：684-690
- 全文大小：2426 K
文摘
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The anatase-TiO2 thin film is bonded directly to the LaAlO3(0 0 1) substrate.
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A well-ordered two-domain (1 × 4) and (4 × 1) reconstruction of anatase-TiO2 surface was observed by RHEED and LEED.
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STM measurements indicates the coexistence of atomic steps of both 2.5 Å and 5 Å.
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The atomic resolution STEM images reveal that the TiO2/LaAlO3 interface to be terminated with LaO layer.