Study on the electrical transport properties of La2/3Ba1/3MnO3:Ag0.04/LaAlO3 (001) films
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文摘
La2/3Ba1/3MnO3: wt%Agx (LBMO:Agx, x=0.04) films were prepared on single crystalline (001)-orientated LaAlO3 substrates by pulsed laser deposition technique. All the samples show along the (00l) orientation in rhombohedral structure with R3c space group. The surface roughness (Ra), insulator-metal transition temperature (Tp) and resistivity at Tp (ρTp) of the LBMO:Ag0.04 films reached optimal values of 3.29 nm, 288 K and 0.033 Ω cm at 740 °C, respectively. The improvement of electrical transport properties in the films are attributed to the optimal growth temperature and Ag-doping improve the microstructure of the surfaces, grain boundaries (GBs) in connectivity and better crystallization. In addition, the electrical conduction behaviors can be well fitted with the grain/domain boundary, electronelectron and magnon scattering mechanisms in the ferromagnetic metallic region (T<Tp), as well as with the adiabatic small polaron hopping mechanism in the paramagnetic insulating region (T>Tp).

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