Characteristics of SiOx-containing hard film prepared by low temperature plasma enhanced chemical vapor deposition using hexamethyldisilazane or vinyltrimethylsilane and post oxygen plasma treatment

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• 作者：Yi-Syuan Wei^a ; Wan-Yu Liu^a ; Hsin-Ming Wu^a ; Ko-Shao Chen^a ; ^{kschen@ttu.edu.tw} ; Vladimir Cech^b
• 关键词：HMDSZ ; VTMS ; Plasma deposition ; Refractive index ; Transmittance
• 刊名：Materials Chemistry and Physics
• 出版年：2017
• 出版时间：1 March 2017
• 年：2017
• 卷：189
• 期：Complete
• 页码：183-190
• 全文大小：2336 K
• 卷排序：189

文摘

With increase in HMDSZ and VTMS deposition times, the film thickness increases and the refractive index decreases. The optical transmittance of PET after the VTMS treatment increases from 89% to 95%. The SiO2 films deposited by HMDSZ+O2 and VTMS+O2 plasma can increase the film hardness and improve light transmittance. It is expected that they can be applied to the optical transmittance protective film on plastic substrate in the future.