Effect of Li addition on the formation of Na-β/βʹʹ-alumina film by laser chemical vapor deposition

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• 作者：Chen Chi^a ; ^b ; Hirokazu Katsui^a ; ^{katsui@imr.tohoku.ac.jp" class="auth_mail" title="E-mail the corresponding author} ; Takashi Goto^a
• 关键词：Beta-alumina ; Laser chemical vapor deposition ; Microstructure ; Low deposition temperature ; Stabilization
• 刊名：Ceramics International
• 出版年：2017
• 出版时间：January 2017
• 年：2017
• 卷：43
• 期：1
• 页码：1278-1283
• 全文大小：1518 K

文摘

Films composed of a mixture of Na-β- and βʹʹ aluminas (β/βʹʹ-alumina) were prepared via laser chemical vapor deposition (CVD) upon the addition of Li. The effect of the Li source gas on the phase formation, microstructure and deposition rates of the β/βʹʹ-alumina films was investigated. The Na-β/βʹʹ-alumina films were formed at a Li/Al precursor supply ratio (Rb>Li/Alb>) of 0.1–1.0 within a deposition temperature (Tb>depb>) range of 1100–1220 K. The Na-β/βʹʹ-alumina phase was exclusively formed at Tb>depb>=1165–1185 K and Rb>Li/Alb>=0.1–0.5, whereas α-Alb>2b>Ob>3b> (with minor amounts of LiAlOb>2b> and LiAlb>5b>Ob>8b>) was predominantly observed at Tb>depb>>1223 K and Rb>Li/Alb> >1.0. The Na-β/βʹʹ-alumina films were composed of polygonal facets in sizes of several hundred nanometers with a columnar cross section. The deposition rate of the Na-β/βʹʹ-alumina film was 60 µm h⁻¹.