Alumina and titania films deposition by APS/ASPPS dual mode thermal spray equipment using Ar added Nb>2b> working gas

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• 作者：Yasutaka Ando^a ; ^{yando@ashitech.ac.jp} ; Dickson Kindole^a ; Yoshimasa Noda^b ; Richard N. Mbiu^c ; Bernerd K. Kosgey^c ; Stephen M. Maranga^c ; Akira Kobayashi^d ; ^e ; ^f
• 关键词：Aluminum oxide ; Titanium oxide ; Atmospheric thermal plasma spray (APS) ; Atmospheric solution precursor plasma spray (ASPPS) ; Photo-catalyst ; Surface modification ; Chemical vapor deposition (CVD)
• 刊名：Vacuum
• 出版年：2017
• 出版时间：February 2017
• 年：2017
• 卷：136
• 期：Complete
• 页码：203-208
• 全文大小：1559 K
• 卷排序：136

文摘

APS/ASPPS dual mode thermal spray equipment with suction type feedstock feeder could be developed. Alumina and titania films with practical strength could be obtained even in case of 1 kW class APS equipment by slight Ar addition to N2 working gas. Rutile rich TiO2 film could be deposited in case of ASPPS on almost the same conditions as that in case of APS.