Impacts of bacteria and corrosion on removal of NOM and DBPs were studied. 40 mJ/cm2 UV dose had little effect on the changes of NOM structure. Chlorine reacted with phenolic OH groups and C-H of aromatic ring to form DBPs. UV/Cl2 disinfection controlled the bacterial regrowth and corrosion rate in AR. Lower corrosion rate and bacterial regrowth decreased the removal of NOM and DBPs.