Theoretical investigation of in situ k-restore processes for damaged ultra-low-k dielectrics
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- 作者：Anja Fö ; rstera ; b ; Christian Wagnerb ; Jö ; rg Schustera ; Sibylle Gemmingb ; c
- 关键词：k-Restore ; Low-k materials ; DFT ; MD ; Plasma repair
- 刊名：Microelectronic Engineering
- 出版年：2016
- 出版时间：20 April 2016
- 年：2016
- 卷：156
- 期：Complete
- 页码：121-125
- 全文大小：1061 K
文摘
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Bis(dimethylamino)-dimethylsilane (DMADMS) fragments primary to Si(CH3)3
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Octamethylcyclotetrasiloxane (OMCTS) fragments primary to SiO(CH3)2
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The favored fragments of OMCTS are very effective repair fragments.
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Plasma repair is less effective for DMADMS due to its lack of oxygen.