The effects of vacuum-ultraviolet radiation on defects in low-k organosilicate glass (SiCOH) as measured with electron-spin resonance
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- 作者：Panpan Xuea ; Dongfei Peia ; Huifeng Zhenga ; Weiyi Lia ; Valeri V. Afanas'evb ; Mikhail R. Baklanovf ; Jean-Francois de Marneffec ; Yi-Hung Lind ; Hok-Sum Fungd ; Cheng-chi Chend ; Yoshio Nishie ; J. Leon Shoheta ; shohet@engr.wisc.edu" class="auth_mail" title="E-mail the corresponding author
- 关键词：Low-k ; Dielectrics ; Vacuum ultraviolet ; Damage ; Defect concentrations ; Electron spin resonance
- 刊名：Thin Solid Films
- 出版年：2016
- 出版时间：1 October 2016
- 年：2016
- 卷：616
- 期：Complete
- 页码：23-26
- 全文大小：456 K
文摘
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Minimizes/eliminates error in electron-spin measurements low-k dielectric films
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Determines effects of vacuum-ultraviolet radiation on defects in low-k dielectrics
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Shows how the radiation affects mechanical and electrical properties
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Suggests methods to mitigate damage