BaZrxTi2?xO5 thin films prepared by sol-gel method
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BaZrxTi2?xO5 thin films (x = 0, 0.01, 0.02, 0.03 and 0.04) were prepared by sol-gel method. The effect of the Zr content on microstructure and electrical properties of BaZrxTi2?xO5 thin films was investigated. The single-phase BaZrxTi2?xO5 films were obtained at 700 ¡ãC with x = 0-0.02, and 800-900 ¡ãC with x = 0-0.04. With increasing the Zr content, the annealing temperature to obtain the single BaTi2O5 phase increased. The dielectric and ferroelectric properties were improved due to the Zr substitution. The BaZrxTi2?xO5 thin film with x = 0.02 had the maximum dielectric constant (¦År) of 53 at 1 MHz, and the BaZrxTi2?xO5 thin film with x = 0.01 had the maximum remnant polarization (2Pr) of 1.37 ¦ÌC cm?2.

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