Effect of analysis direction on the measurement of interfacial mixing in thin metal layers with atom probe tomography
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- 作者：D.J. Larson
- 关键词：Atom probe tomography ; Thin films ; Chemical intermixing
- 刊名：Ultramicroscopy
- 出版年：2011
- 出版时间：May 2011
- 年：2011
- 卷：111
- 期：6
- 页码：506-511
- 全文大小：795 K
文摘
The accuracy and precision of thin-film interfacial mixing as measured with atom probe tomography (APT) are assessed by considering experimental and simulated field-evaporation of a Co/Cu/Co multilayer structure. Reconstructions were performed using constant shank angle and Z-scale reordering algorithms. Reconstruction of simulated data (zero intermixing) results in a 10–90 % intermixing width of 0.2 nm while experiential intermixing (measured from multiple runs) was 0.47±0.19 and 0.49±0.10 nm for Co-on-Cu and Cu-on-Co interfaces, respectively. The experimental data were collected in analysis orientations both parallel and anti-parallel to film growth direction and the impact of this on the interfacial mixing measurements is discussed. It is proposed that the resolution of such APT measurements is limited by the combination of specimen shape and reconstruction algorithms rather than by an inherent instrumentation limit.