First-principles predictions of ruthenium-phosphorus and ruthenium-boron glassy structures and chemical vapor deposition of thin amorphous ruthenium-boron alloy films

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• 作者：Daniel E. Bost ; Hyun-Woo Kim¹ ; Chia-Yun Chou ; Gyeong S. Hwang ; John G. Ekerdt ; ^{ekerdt@utexas.edu}
• 关键词：Amorphous thin film ; Ruthenium alloy ; Copper diffusion barrier ; Boron ; First-principles density-functional calculations
• 刊名：Thin Solid Films
• 出版年：2017
• 出版时间：31 January 2017
• 年：2017
• 卷：622
• 期：Complete
• 页码：56-64
• 全文大小：1001 K
• 卷排序：622

文摘

Density-functional calculations reveal a glassy structure for moderate P and B content. The relative stability of amorphous and crystalline Ru(B) alloys is reported. Reports the CVD growth of 3 amorphous Ru(B) thin films using B2H6 as the B source. Amorphous, continuous 3 nm Ru(B) films realized for B content > 15 atom %, as predicted. Electrical field stress tests indicate 3 nm Ru(B) function as a Cu diffusion barrier.