Scalable parallel self-assembly of nanoparticle anti-reflection coatings

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• 作者：Khalid Askar^a ; Jiamin Wang^a ; Sin-Yen Leo^a ; Christopher Kim^a ; Abigail M. Fenton^a ; Peng Jiang^a ; ^{pjiang@che.ufl.edu} ; Bin Jiang^b
• 关键词：Anti-reflection coating ; Colloidal self-assembly ; Electrostatics ; Surface modification ; Bottom-up ; Nanoparticles
• 刊名：Thin Solid Films
• 出版年：2017
• 出版时间：1 January 2017
• 年：2017
• 卷：621
• 期：Complete
• 页码：156-164
• 全文大小：2413 K
• 卷排序：621

文摘

Nanoparticle anti-reflection coatings are assembled by a simple and scalable bottom-up approach. Negative silica nanoparticles are electrostatically adsorbed onto positive glass substrates. The optimal nanoparticle surface coverage is ~ 60% as determined by RCWA simulations. This scalable technology enables parallel coating of multiple substrates with high qualities.