The damage mechanism of fused silica surface induced by 355 nm nanosecond laser

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• 作者：Hongjie Liu^a ; Xinda Zhou^a ; Jin Huang^a ; Zhi Zheng^a ; Fengrui Wang^a ; Xiaodong Jiang ; ^a ; ^{hongjie3713@163.com"" rel=""nofollow} ; Weidong Wu^a ; Wanguo Zheng^a
• 关键词：Fused silica ; Laser induced damage ; Time-resolved imaging ; Plasma
• 刊名：Optik - International Journal for Light and Electron Optics
• 出版年：2011
• 出版时间：September 2011
• 年：2011
• 卷：122
• 期：18
• 页码：1663-1665
• 全文大小：615 K

文摘

In order to understand the physical mechanism, time-resolved dynamics of 355 nm nanosecond laser induced entrance and exit surface damage on fused silica was investigated by using shadow graphic technique. The results show that the damage mechanism is different between the entrance and exit surface during nanosecond laser interaction with fused silica. The plasma and shock waves in air is relatively higher at the entrance surface. The entrance surface damage is reduced because plasma shielding limits energy deposition. Without plasma shielding, the exit surface damage is more serious for more laser energy deposition in material. And without the stress of plasma and shock waves, the material is ejected easily at rear surface. These are confirmed by damage micrograph at the entrance and exit surface.