Low temperature grown highly texture aluminum alloyed iron silicide on silicon substrate for opto-electronic applications
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- 作者：Goutam Kumar Dalapati ; dalapatig@imre.a-star.edu.sg" class="auth_mail" title="E-mail the corresponding author ; Cheng Cheh Tan ; Saeid Masudy-Panah ; Hui Ru Tan ; Dongzhi Chi
- 关键词：Al-alloyed iron-silicide (FeSi2(Al)) ; Alpha-phase iron-silicide ; Low thermal budget ; Highly texture α-FeSi2(Al)
- 刊名：Materials Letters
- 出版年：2015
- 出版时间：15 November 2015
- 年：2015
- 卷：159
- 期：Complete
- 页码：455-458
- 全文大小：1807 K
文摘
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Alphas-phase aluminum alloyed iron-silicide, α-FeSi(Al) grown at 600 °C.
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Highly texture α-FeSi(Al) grown by using conventional sputter.
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The α-FeSi(Al) ternary alloy has high work function of ∼5.3 eV.
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Transition temperature of α-phase FeSi2 reduces to 600 °C through Al incorporation.
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α-FeSi(Al) suitable for renewable energy and electronic applications.