Growth and characterization of ultrathin TiO2-Cr2O3 nanocomposite films
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文摘
Growth of TiO2-Cr2O3 nanocomposite ultrathin films (30 nm) by sputtering technique. The deposited films are annealed to grow rutile TiO2 and eskolaite Cr2O3 phases. Grains of nanocomposite films (15–40 nm) are smaller than pristine films (50 nm). Raman A1g (Cr2O3) and Eg (TiO2) modes are found to be red-shifted from bulk values. FWHM of the Raman A1g and Eg modes are increased due to composite formation.

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