TEM study of tantalum clusters on Al2O3/NiAl(110)
详细信息 查看全文
- 作者：Kuhlenbeck ; H. ; Nepijko ; S.A. ; Klimenkov ; M. ; Freund ; H.-J. ; Zemlyanov ; D. ; Herein ; D. ; Schlö ; gl ; R.
- 关键词：Aluminum oxide ; Cluster ; Energy dispersive X-ray analysis ; Tantalum ; Thin films ; Transmission electron microscopy ; X-ray photoelectron spectroscopy
- 刊名：Surface Science
- 出版年：1998
- 出版时间：September 3, 1998
- 年：1998
- 卷：412-413
- 期：Complete
- 页码：192-201
- 全文大小：1.39 M
文摘
Employing transmission electron microscopy (TEM), energy dispersive X-ray analysis (EDX) and X-ray photoelectron spectroscopy (XPS) we have studied tantalum clusters on a thin Al2O3 film epitaxially grown on NiAl(110). Our data reveal that the clusters are three dimensional, growing epitaxially on the oxide film with their [110] directions parallel to the surface normal and Ta[001]
NiAl[001]. From the observed moire fringes the tantalum lattice constant could he determined as a function of the cluster size. We found that the lattice constant decreases with decreasing cluster size with the highest observed reduction being 4.5 % for a cluster with a diameter of 12.5 Å. Interestingly the clusters are only partly oxidized as concluded from XPS, TEM and EDX data although the samples were exposed to air after cluster deposition.
NiAl[001]. From the observed moire fringes the tantalum lattice constant could he determined as a function of the cluster size. We found that the lattice constant decreases with decreasing cluster size with the highest observed reduction being 4.5 % for a cluster with a diameter of 12.5 Å. Interestingly the clusters are only partly oxidized as concluded from XPS, TEM and EDX data although the samples were exposed to air after cluster deposition.