Influence of sputter damage on the XPS analysis of metastable nanocomposite coatings

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• 作者：Erik Lewin ; Mihaela Gorgoi ; Franz Schä ; fers ; Svante Svensson ; Ulf Jansson
• 关键词：Sputtering ; X-ray photoelectron spectroscopy (XPS) ; Nanocomposite ; Metastable phases ; Sputtering artifacts
• 刊名：Surface and Coatings Technology
• 出版年：2009
• 出版时间：15 November 2009
• 年：2009
• 卷：204
• 期：4
• 页码：455-462
• 全文大小：1104 K

文摘

X-ray photoelectron spectroscopy (XPS) is a standard method of determining chemical bonding in e.g. nanocomposites. We demonstrate that sputter-cleaning of the sample prior to analysis can substantially alter the attained information. We present an in-depth analysis of sputter damage on binary and ternary TiC-based coatings in the Ti–Ni–C system. XPS was performed after sputter etching with different ion energies (0.15–4 keV). Results are compared to data from the bulk of undamaged samples attained using high kinetic energy XPS. We observe substantial sputter damage, strongly dependent on sputter energies and coating stability. Metastable samples exhibit severe sputter damage after etching with 4 keV. Additional samples from other Ti–Me–C (Me = Al, Fe, Cu or Pt) systems were also examined, and notable sputter damage was observed. This suggests that accurate analysis of any metastable nanocomposite requires careful consideration of sputter damages.