Effects of substrate temperature on the structure, residual stress and nanohardness of Ti6Al4V films prepared by magnetron sputtering
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- 作者：Gang Liu ; Yanqing Yang ; yangyanqingdaoshi@163.com" class="auth_mail" title="E-mail the corresponding author ; Bin Huang ; Xian Luo ; Sheng Ouyang ; Guangming Zhao ; Na Jin ; Pengtao Li
- 关键词：Ti6Al4V films ; Magnetron sputtering ; Structure ; Residual stress ; Nanohardness
- 刊名：Applied Surface Science
- 出版年：2016
- 出版时间：1 May 2016
- 年：2016
- 卷：370
- 期：Complete
- 页码：53-58
- 全文大小：1856 K
文摘
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The Ti6Al4V films transform from columnar to equiaxial growth as the Ts rises.
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A schematic diagram is established to show the structure evolution in the films.
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The residual compressive stress and nanohardness decrease as the Ts rises.