Quality-enhanced GaN epitaxial films grown on (La, Sr) (Al, Ta)O3 substrates by pulsed laser deposition
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文摘

High-quality GaN films have been epitaxially grown on LSAT substrates by PLD.

Effect of temperature on the property of GaN films grown by PLD is studied in detail.

Abrupt and sharp GaN/LSAT interfaces achieved in this work are of great importance.

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