In situ probing the self-assembly of 3-hexyl-4-amino-1,2,4-triazole-5-thione on chalcopyrite surfaces
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- 作者：Guangyi Liua ; guangyiliu@csu.edu.cn" class="auth_mail" title="E-mail the corresponding author ; Jingjing Xiaoa ; Jun Liua ; Xiaoyan Qua ; Qin Liua ; Hongbo Zengb ; Xianglin Yanga ; Lei Xieb ; Hong Zhonga ; Qingxia Liub ; Zhenghe Xub ; zhenghe@ualberta.ca" class="auth_mail" title="E-mail the corresponding author
- 关键词：3-Hexyl-4-amino-1 ; 2 ; 4-triazole-5-thione ; Self-assembly ; Chalcopyrite ; in situ AFM ; in situ SECM ; ToF-SIMS ; XPS
- 刊名：Colloids and Surfaces A: Physicochemical and Engineering Aspects
- 出版年：2016
- 出版时间：20 December 2016
- 年：2016
- 卷：511
- 期：Complete
- 页码：285-293
- 全文大小：1894 K
文摘
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In situ AFM and SECM investigate HATT self-assembly on chalcopyrite.
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10">HATT aggregated on chalcopyrite to form self-assembled monolayers.
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15">A five-membered-ring Cu(I)-HATT surface complex was recommended.
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HATT’s cover leads to an enhanced hydrophobicity of chalcopyrite.