Surface characterization of silica glass substrates treated by atomic hydrogen

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• 作者：Hiroyuki Inoue ; Atsunobu Masuno ; Keiji Ishibashi ; Hiromasa Tawarayama ; Yingjiu Zhang ; Futoshi Utsuno ; Kazuo Koya ; Akira Fujinoki ; Hiroshi Kawazoe
• 关键词：Surface roughness ; Heat treatment ; OH group ; Power spectral density
• 刊名：Materials Characterization
• 出版年：December, 2013
• 年：2013
• 卷：86
• 期：Complete
• 页码：283-289
• 全文大小：1391 K

文摘

Silica glass substrates with very flat surfaces were exposed to atomic hydrogen at different temperatures and durations. An atomic force microscope was used to measure root-mean-square (RMS) roughness and two-dimensional power spectral density (PSD). In the treatment with atomic hydrogen up to 900 掳C, there was no significant change in the surface. By the treatment at 1000 掳C, the changes in the RMS roughness and the PSD curves were observed. It was suggested that these changes were caused by etching due to reactions of atomic hydrogen with surface silica. By analysis based on the k-correlation model, it was found that the spatial frequency of the asperities became higher with an increase of the treatment time. Furthermore, the data showed that atomic hydrogen can flatten silica glass surfaces by controlling heat-treatment conditions.