Development of in situ, at-wavelength metrology for soft X-ray nano-focusing

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• 作者：Sheng Yuan^a ; ^{syuan@lbl.gov"" rel=""nofollow} ; Valeriy V. Yashchuk^a ; Kenneth A. Goldberg^b ; Richard Celestre^a ; Wayne R. McKinney^a ; Gregory Y. Morrison^a ; Tony Warwick^a ; Howard A. Padmore^a
• 关键词：X-ray ; Synchrotron radiation ; KB mirror ; Metrology ; Wavefront measurements ; Optical slope metrology ; Long trace profiler
• 刊名：Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
• 出版年：2011
• 出版时间：1 September 2011
• 年：2011
• 卷：649
• 期：1
• 页码：160-162
• 全文大小：204 K

文摘

At the Advanced Light Source (ALS), we are developing broadly applicable, high-accuracy, in situ, at-wavelength wavefront slope measurement techniques for Kirkpatrick–Baez (KB) mirror nano-focusing. We describe here details of the metrology beamline endstation, the at-wavelength tests, and an original alignment method that have already allowed us to precisely set a bendable KB mirror to achieve a FWHM focused spot size of 120 nm, at 1 nm soft X-ray wavelength.