Effects of Al concentrations on the microstructure and mechanical properties of Ti-Al-N films deposited by RF-ICPIS enhanced magnetron sputtering
详细信息 查看全文
- 作者：Dongke Lia ; JunFang Chena ; b ; chenjf@scnu.edu.com" class="auth_mail ; Changwei Zouc ; qingyihaiyanas@163.com" class="auth_mail ; Junhui Maa ; Pengfei Lia ; Ye Lia
- 关键词：Ti&ndash ; Al&ndash ; N ; RF-ICP ion source ; Microstructure ; Mechanical properties
- 刊名：Journal of Alloys and Compounds
- 出版年：5 October 2014
- 年：2014
- 卷：609
- 期：Complete
- 页码：239-243
- 全文大小：1359 K
文摘
- •
RF-ICPIS enhanced magnetron sputtering technique is used for Ti–Al–N deposition.
- •
Al contents has closed relation with total gas pressure.
- •
Ti–Al–N films with high Al contents of 34.16 at.% are obtained.
- •
Effects of Al on the microstructure and mechanical properties are discussed.