Microcavity light-emitting diodes (MCLEDs) with top-emitting geometry have been grown by molecular beam epitaxy on GaAs and Si substrates. External quantum efficiencies of up to 10 % were obtained for 420×420 μm2 homoepitaxial devices. The efficiency of 32×32 μm2 diodes was 4 % for homoepitaxial devices and 1 % for diodes realized on conformal GaAs-on-Si stripes. Much lower efficiencies were obtained for devices grown directly on GaAs-on-Si seed layers, demonstrating that the conformal epitaxy technique leads to an improvement of the GaAs-on-Si materials quality. These results underline the promise of the conformal epitaxy approach for the realization of monolithically integrated light emitters on silicon substrates.