Degradation of naproxen by UV, VUV photolysis and their combination

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• 作者：Eszter Arany ; Rita Katalin Szab贸 ; L谩szl贸 Ap谩ti ; T眉nde Alapi ; Istv谩n Ilisz ; Patrick Mazellier ; Andr谩s Dombi ; Krisztina Gajda-Schrantz
• 关键词：Naproxen ; UV/VUV photolysis ; Advanced oxidation process ; Dissolved O2 ; Mineralization
• 刊名：Journal of Hazardous Materials
• 出版年：15 November, 2013
• 年：2013
• 卷：262
• 期：Complete
• 页码：151-157
• 全文大小：1066 K

文摘

Naproxen is a widely used nonsteroidal anti-inflammatory drug. Recently, this medicine was detected both in natural waters (up to 1.5 渭g L^鈭?) and in sewage treatment plant effluents (up to 5.2 渭g L^鈭?). Moreover, naproxen is only partly eliminated by classical processes used in sewage treatment plants. Therefore, its degradation is of utmost interest. Advanced oxidation processes proved to be the most suitable methods for the elimination of persistent organic contaminants. In this work ultraviolet (UV, 254 nm), vacuum ultraviolet photolysis (VUV, 172 nm) and their combination (UV/VUV, 254/185 nm) were investigated. The efficiency of the methods increased in the following order: UV < VUV <  UV/VUV photolysis. However, VUV irradiation was found to mineralize the contaminant molecule most effectively. The chemical structures of three out of four aromatic by-products and of some aliphatic carboxylic acids were presumed. The effects of dissolved O₂ and the initial concentration of naproxen on the degradation were also investigated.